喷涂硅铝靶材 SpraySiAl Target
产品说明Productdescription
以等离子体为热源,在大气环境下通过一定的气氛保护装置,将Si+Al粉末加热到熔融或半熔融状态并高速冲击背管表面形成致密涂层,从而制备出高纯度、低氧含量、高致密度SiAl靶材。
Withplasma as the heat source, high purity, low oxygen content, highdensity SiAl targets are produced by using Si and Alpowders. The startingSi and Al powdersare heated to molten or semi-molten state withthe protection of certain atmosphere and sprayed onthe surface of backing tube at high speeds toform dense coatings.
项目 Item | 参数 Specifications | 检测手段 Testingmethod |
纯度 Purity | ≥99.9% | |
Al含量 AlContent | 8-10% | |
密度 Density | ≥2.2g/cm3 | |
杂质含量 Impurities | Fe: ≤350ppm Ca: ≤50ppm Cu: ≤50ppm Mg:≤20ppm Ni: ≤20ppm O: ≤6000ppm N: ≤500ppm 杂质总和(O、N除外): ≤1000ppm Totalimpurity (excludingO, N) | ICP 氧氮分析仪 Oxygen andnitrogen analyzer
|
电阻率 Electricalresistivity | ≤50mΩ∙cm | 四探针电阻率仪 Four-proberesistivity meter |
背管材质 Backingtube
-选用304/316L不锈钢(无磁)
304/316L stainlesssteel (non-magnetic)
靶材尺寸Dimension
-按照图纸要求加工
According tocustomized drawings
应用领域Applications
-用于制作SiO2膜、Si3N4膜,主要用于光学玻璃AR膜,LOW-E镀膜玻璃,半导体电子器件,TFT-LCD,平面显示,触摸屏玻璃。
For depositionof SiO2 and Si3N4 films,whichare used for ARfilms ofoptical glasses,LOW-E glasses,electronicdevices, TFT-LCD, flatpanel screens,touch screen glasses.